International Patent: SYSTEM AND METHODS OF LITHOGRAPHIC EXPOSURE TO IMPROVE ETCH PERFORMANCE AND YIELD

GENEVA, Aug. 21 -- TOKYO ELECTRON LIMITED filed a patent application (US2026/015157) for “SYSTEM AND METHODS OF LITHOGRAPHIC EXPOSURE TO IMPROVE ETCH PERFORMANCE AND YIELD”. With publication no. WO/2026/174128, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....