GENEVA, July 1 -- ASML NETHERLANDS B.V. filed a patent application (EP2025/083438) for “SYSTEM AND METHOD FOR OPTIMIZING TARGET RAREFACTION FOR ENHANCING EUV RADIATION FROM A LASER-PRODUCED PLASMA”. With publication no. WO/2026/124932, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H05G 2/00
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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