INTERNATIONAL PATENT: SUZHOU XRISE ADVANCED MATERIAL TECHNOLOGY CO., LTD., 苏州协晟新材料技术有限公司 FILES APPLICATION FOR "ULTRAFINE NANO-SILICON-BASED NEGATIVE ELECTRODE MATERIAL PREPARED ON BASIS OF IN-SITU HIGH-TEMPERATURE PHASE CHANGE IN CONFINEMENT MICROCAVITY AND PREPARATION METHOD THEREFOR"

GENEVA, April 27 -- SUZHOU XRISE ADVANCED MATERIAL TECHNOLOGY CO., LTD. (Room 1402-1, Building 4, No. 209, Zhuyuan Road, High-Tech ZoneSuzhou, Jiangsu 215000), 苏州协晟新材料技术有限公司 (中国江苏省苏州市高新区竹园路209号4号楼1402-1室) filed a patent application (PCT/CN2025/126607) for "ULTRAFINE NANO-SILICON-BASED NEGATIVE ELECTRODE MATERIAL PREPARED ON BASIS OF IN-SITU HIGH-TEMPERATURE PHASE CHANGE IN CONFINEMENT MICROCAVITY, AND PREPARATION METHOD THEREFOR" on Oct 09, 2025. With publication no. WO/2026/081918, the details related to the patent application...