GENEVA, Feb. 23 -- SUMITOMO ELECTRIC INDUSTRIES, LTD. (5-33, Kitahama 4-chome, Chuo-ku, Osaka-shi, Osaka5410041), 住友電気工業株式会社 (大阪府大阪市中央区北浜四丁目５番３３号) filed a patent application (PCT/JP2024/028888) for "METHOD FOR MANUFACTURING SILICON CARBIDE EPITAXIAL SUBSTRATE AND METHOD FOR MANUFACTURING SILICON CARBIDE SEMICONDUCTOR DEVICE" on Aug 13, 2024. With publication no. WO/2026/038306, the details related to the patent application was published on Feb 19, 2026.
Notably, the patent application was submitted under the International Patent Classificat...