International Patent: SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

GENEVA, July 27 -- TOKYO ELECTRON LIMITED filed a patent application (JP2026/000197) for “SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD”. With publication no. WO/2026/155035, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10P 14/22

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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