GENEVA, Sept. 18 -- TOKYO ELECTRON LIMITED filed a patent application (JP2026/006635) for “SUBSTRATE PROCESSING SYSTEM AND CONTROL METHOD FOR SUBSTRATE PROCESSING SYSTEM”. With publication no. WO/2026/186529, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 72/70
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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