International Patent: SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM

GENEVA, July 18 -- TOKYO ELECTRON LIMITED filed a patent application (JP2025/043321) for “SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM”. With publication no. WO/2026/150732, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/11

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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