International Patent: SPUTTERING TARGET MATERIAL, METHOD FOR PRODUCING SPUTTERING TARGET MATERIAL, MASK BLANK, AND METHOD FOR PRODUCING MASK BLANK

GENEVA, July 31 -- HOYA CORPORATION filed a patent application (JP2025/045577) for “SPUTTERING TARGET MATERIAL, METHOD FOR PRODUCING SPUTTERING TARGET MATERIAL, MASK BLANK, AND METHOD FOR PRODUCING MASK BLANK”. With publication no. WO/2026/160122, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 14/34

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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