International Patent: SPHERICAL SILICA WITH LOW THIXOTROPY AND HIGH FLUIDITY, PREPARATION METHOD THEREFOR AND USE THEREOF

GENEVA, June 26 -- NOVORAY CORPORATION filed a patent application (CN2025/114309) for “SPHERICAL SILICA WITH LOW THIXOTROPY AND HIGH FLUIDITY, PREPARATION METHOD THEREFOR AND USE THEREOF”. With publication no. WO/2026/118531, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C08L 63/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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