GENEVA, June 24 -- HITACHI HIGH-TECH CORPORATION filed a patent application (JP2025/021787) for “SPECTRAL IMAGING SYSTEM AND METHOD FOR MANUFACTURING SPECTRAL IMAGING SYSTEM”. With publication no. WO/2026/115779, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G01J 3/51
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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