INTERNATIONAL PATENT: SOLVAY SA FILES APPLICATION FOR "METHOD FOR CLEANING OF CVD TOOLS WITH IN SITU PLASMA SOURCES USING A F2/AR/N2 OR F2/ARF/N2 OR F2/AR/ARF/N2 MIXTURE WITH LOW AR OR LOW ARF OR LOW AR/ARF CONTENT"

GENEVA, March 23 -- SOLVAY SA (Rue de Ransbeek, 3101120 Brussels) filed a patent application (PCT/EP2025/075287) for "METHOD FOR CLEANING OF CVD TOOLS WITH IN SITU PLASMA SOURCES USING A F2/AR/N2 OR F2/ARF/N2 OR F2/AR/ARF/N2 MIXTURE WITH LOW AR OR LOW ARF OR LOW AR/ARF CONTENT" on Sep 05, 2025. With publication no. WO/2026/057474, the details related to the patent application was published on Mar 19, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): PITTROFF, Michael (Hans-Bockler-Allee 2030173 Hannover), SCHWARZE, Thomas (Hans-Bockler-Allee 2030173 Hannove), WIELAND, Robert (Haidelweg 2881241...