GENEVA, July 2 -- JAPAN FINE CERAMICS CO.,LTD. filed a patent application (JP2025/041864) for “SILICON NITRIDE SUBSTRATE AND PRODUCTION METHOD FOR SAME”. With publication no. WO/2026/133929, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C04B 35/596
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....