INTERNATIONAL PATENT: SIEMENS INDUSTRY SOFTWARE INC. FILES APPLICATION FOR "OPTICAL PROXIMITY CORRECTION-BASED TEST PATTERN GENERATION"

GENEVA, Feb. 18 -- SIEMENS INDUSTRY SOFTWARE INC. (5800 Granite Parkway, Suite 600Plano, Texas 75024) filed a patent application (PCT/US2024/041485) for "OPTICAL PROXIMITY CORRECTION-BASED TEST PATTERN GENERATION" on Aug 08, 2024. With publication no. WO/2026/035269, the details related to the patent application was published on Feb 12, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): FENGER, Germain Louis (7675 Cason LaneGladstone, Oregon 97027)

Abstract: Systems and methods are presented for optical proximity correction (OPC)-based generation of test patterns. A method may include accessin...