INTERNATIONAL PATENT: SHANGHAITECH UNIVERSITY, 上海科技大学 FILES APPLICATION FOR "PLASMA SPRAY GUN APPARATUS COMPATIBLE WITH NEAR-ATMOSPHERIC PRESSURE PHOTOELECTRON SPECTROSCOPY"

GENEVA, May 3 -- SHANGHAITECH UNIVERSITY (No. 393, Middle Huaxia RoadPudong New Area, Shanghai 201210), 上海科技大学 (中国上海市浦东新区华夏中路393号) filed a patent application (PCT/CN2025/128141) for "PLASMA SPRAY GUN APPARATUS COMPATIBLE WITH NEAR-ATMOSPHERIC PRESSURE PHOTOELECTRON SPECTROSCOPY" on Oct 16, 2025. With publication no. WO/2026/086677, the details related to the patent application was published on Apr 30, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): CAI, ...