GENEVA, March 22 -- SHANGHAI WEISHI SEMICONDUCTOR CO., LTD. (Room 6212, Building C, No.555 Dongchuan RoadMinhang District, Shanghai 201401), 上海微世半导体有限公司 (中国上海市闵行区东川路555号丙楼6212室) filed a patent application (PCT/CN2025/104171) for "VERTICAL CHEMICAL VAPOR DEPOSITION FURNACE" on Jun 27, 2025. With publication no. WO/2026/056422, the details related to the patent application was published on Mar 19, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Orga...