International Patent: SHAFT FURNACE FOR THE THERMAL PURIFICATION OF HIGH-PURITY SILICON DIOXIDES, AND ASSOCIATED OPERATING METHOD

GENEVA, Aug. 7 -- DORFNER ANZAPLAN GMBH filed a patent application (EP2026/052001) for “SHAFT FURNACE FOR THE THERMAL PURIFICATION OF HIGH-PURITY SILICON DIOXIDES, AND ASSOCIATED OPERATING METHOD”. With publication no. WO/2026/162483, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: F27B 1/08

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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