GENEVA, July 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/050567) for “SELECTIVE HARD MASK ETCHING USING NON-PLASMA MICROWAVE PROCESSING”. With publication no. WO/2026/151487, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H10P 50/28
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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