International Patent: RUN-VENT SYSTEM FOR SIMULTANEOUSLY DEPOSITING LAYERS IN A PLURALITY OF PROCESS CHAMBERS OF A CVD REACTOR

GENEVA, June 26 -- AIXTRON SE filed a patent application (EP2025/084852) for “RUN-VENT SYSTEM FOR SIMULTANEOUSLY DEPOSITING LAYERS IN A PLURALITY OF PROCESS CHAMBERS OF A CVD REACTOR”. With publication no. WO/2026/119764, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/44

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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