GENEVA, July 1 -- EBARA CORPORATION filed a patent application (JP2024/044179) for “RESISTOR MASK, PLATING APPARATUS, AND PLATING METHOD”. With publication no. WO/2026/126471, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C25D 17/10
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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