International Patent: RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

GENEVA, Oct. 1 -- NISSAN CHEMICAL CORPORATION filed a patent application (JP2026/008857) for “RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE”. With publication no. WO/2026/191837, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10P 10/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....