GENEVA, July 18 -- LIRUN (SHANGHAI) CLEAN TECHNOLOGY CO., LTD. filed a patent application (CN2025/140198) for “RECYCLING METHOD FOR MIXED-ACID WASTE SOLUTION CONTAINING HYDROFLUORIC ACID”. With publication no. WO/2026/149101, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B01D 61/28
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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