GENEVA, March 2 -- RAMOT AT TEL-AVIV UNIVERSITY LTD. (P.O. Box 392966139201 Tel Aviv) filed a patent application (PCT/IL2025/050704) for "ASYMMETRIC CHEMICAL VAPOR DEPOSITION AND USE THEREOF IN THE GROWTH OF GRAPHITE" on Aug 18, 2025. With publication no. WO/2026/042065, the details related to the patent application was published on Feb 26, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): ISMACH, Ariel (c/o RAMOT AT TEL-AVIV UNIVERSITY LTD.P.O. Box 392966139201 Tel Aviv)
Abstract: The present invention relates to a system and method of producing multilayer graphene using asymmetric CVD. The ...