International Patent: RADICAL SUPPLY DEVICE, SUBSTRATE PROCESSING DEVICE, RADICAL GENERATION METHOD, AND SUBSTRATE PROCESSING METHOD

GENEVA, July 9 -- TOKYO ELECTRON LIMITED filed a patent application (JP2025/045424) for “RADICAL SUPPLY DEVICE, SUBSTRATE PROCESSING DEVICE, RADICAL GENERATION METHOD, AND SUBSTRATE PROCESSING METHOD”. With publication no. WO/2026/146625, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: C23C 16/44

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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