International Patent: RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, POLYMER, AND MONOMER

GENEVA, July 6 -- JSR CORPORATION filed a patent application (JP2025/044664) for “RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, POLYMER, AND MONOMER”. With publication no. WO/2026/141230, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/004

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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