International Patent: RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, COMPOUND, AND POLYMER

GENEVA, July 2 -- JSR CORPORATION filed a patent application (JP2025/037499) for “RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, COMPOUND, AND POLYMER”. With publication no. WO/2026/133733, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/039

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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