International Patent: RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, COMPOUND, AND POLYMER

GENEVA, Oct. 22 -- JSR CORPORATION filed a patent application (JP2026/010985) for “RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, COMPOUND, AND POLYMER”. With publication no. WO/2026/220786, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/004

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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