International Patent: PROCESSING SYSTEM, INCREMENTAL POSITION MEASUREMENT SYSTEM, POSITIONING SYSTEM, EXPOSURE APPARATUS, PROJECTION SYSTEM FOR AN OPTICAL LITHOGRAPHY SYSTEM, METHOD TO DETERMINE A POSITION OF A MOVABLE OBJECT AND METHOD FOR CALIBRATION OF AN INCREMENTAL POSITION MEASUREMENT SYSTEM

GENEVA, Sept. 18 -- ASML NETHERLANDS B.V. filed a patent application (EP2026/053771) for “PROCESSING SYSTEM, INCREMENTAL POSITION MEASUREMENT SYSTEM, POSITIONING SYSTEM, EXPOSURE APPARATUS, PROJECTION SYSTEM FOR AN OPTICAL LITHOGRAPHY SYSTEM, METHOD TO DETERMINE A POSITION OF A MOVABLE OBJECT AND METHOD FOR CALIBRATION OF AN INCREMENTAL POSITION MEASUREMENT SYSTEM”. With publication no. WO/2026/184956, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G01B 9/02003

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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