International Patent: PROCESS FOR THERMAL TREATMENT OF A WAFER OF MONOCRYSTALLINE SILICON AND WAFER OF MONOCRYSTALLINE SILICON

GENEVA, Aug. 31 -- SILTRONIC AG filed a patent application (EP2026/054425) for “PROCESS FOR THERMAL TREATMENT OF A WAFER OF MONOCRYSTALLINE SILICON AND WAFER OF MONOCRYSTALLINE SILICON”. With publication no. WO/2026/175910, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H10P 95/40

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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