GENEVA, Oct. 30 -- HITACHI HIGH-TECH CORPORATION filed a patent application (JP2025/015818) for “PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD”. With publication no. WO/2026/224859, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H01L 21/3065
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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