International Patent: PLASMA-TREATED SILICON-CONTAINING RESIST UNDERLAYER FILM, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND LAMINATE

GENEVA, Oct. 1 -- NISSAN CHEMICAL CORPORATION filed a patent application (JP2026/008682) for “PLASMA-TREATED SILICON-CONTAINING RESIST UNDERLAYER FILM, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND LAMINATE”. With publication no. WO/2026/191803, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/11

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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