International Patent: PLASMA SOURCE AND SUBSTRATE PROCESSING DEVICE

GENEVA, Aug. 7 -- WONIK IPS CO., LTD filed a patent application (KR2025/095768) for “PLASMA SOURCE AND SUBSTRATE PROCESSING DEVICE”. With publication no. WO/2026/164391, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01J 37/32

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Disclaimer: Curated by HT Syndication....