GENEVA, Aug. 21 -- TRUMPF HUETTINGER SP. Z O. O. filed a patent application (EP2026/053604) for “PLASMA PROCESS SYSTEM, HP-HV-PULSED POWER SUPPLY AND METHOD”. With publication no. WO/2026/171748, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H02M 3/158
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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