GENEVA, July 2 -- NEW POWER PLASMA CO.,LTD. filed a patent application (KR2024/020710) for “PLASMA POWER CONTROL DEVICE FOR INDEPENDENT CONTROL OF HIGH FREQUENCY AMPLITUDE AND PLASMA GENERATION FACILITY INCLUDING SAME”. With publication no. WO/2026/134376, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: H02M 1/00
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....