GENEVA, May 6 -- PHOTRONICS, INC. (15 Secor RoadBrookfield, CT 06804) filed a patent application (PCT/US2025/052284) for "SYSTEM AND METHOD FOR PHOTOMASK DATABASE INSPECTION USING MODEL BASED LAYOUT RENDERING" on Oct 23, 2025. With publication no. WO/2026/090428, the details related to the patent application was published on Apr 30, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): RAMADAN, Mohamed (1367 Whispering Wind LnCorona, CA 92881), PROGLER, Christopher (5412 Blackhawk Dr.Plano, TX 75093), KIM, Jongmin (5410 South Polaris AvenueMeridian, ID 83642)
Abstract: A method for detecting phot...