International Patent: PHOTOSENSITIVE ELEMENT, PRODUCTION METHOD THEREFOR, RESIST PATTERN PRODUCTION METHOD, AND CONDUCTIVE PATTERN PRODUCTION METHOD

GENEVA, Aug. 14 -- RESONAC CORPORATION filed a patent application (JP2025/004137) for “PHOTOSENSITIVE ELEMENT, PRODUCTION METHOD THEREFOR, RESIST PATTERN PRODUCTION METHOD, AND CONDUCTIVE PATTERN PRODUCTION METHOD”. With publication no. WO/2026/167836, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/004

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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