GENEVA, Sept. 18 -- HITACHI HIGH-TECH ANALYSIS CORPORATION filed a patent application (JP2025/030311) for “PARTICLE MEASUREMENT DEVICE AND PARTICLE MEASUREMENT METHOD”. With publication no. WO/2026/186180, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G01N 15/0205
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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