International Patent: OXIDE SEMICONDUCTOR FILM AND METHOD FOR MANUFACTURING SAME, TRANSISTOR, SEMICONDUCTOR DEVICE, ELECTRONIC CIRCUIT, ELECTRICAL DEVICE, ELECTRONIC DEVICE, VEHICLE, AND POWER ENGINE

GENEVA, Aug. 21 -- IDEMITSU KOSAN CO.,LTD. filed a patent application (JP2025/005067) for “OXIDE SEMICONDUCTOR FILM AND METHOD FOR MANUFACTURING SAME, TRANSISTOR, SEMICONDUCTOR DEVICE, ELECTRONIC CIRCUIT, ELECTRICAL DEVICE, ELECTRONIC DEVICE, VEHICLE, AND POWER ENGINE”. With publication no. WO/2026/172500, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: H01L 21/365

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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