GENEVA, May 11 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中央区日本橋二丁目５番１号) filed a patent application (PCT/JP2025/038137) for "COMPOSITION FOR FORMING RESIST UNDERLAYER FILM" on Oct 30, 2025. With publication no. WO/2026/094993, the details related to the patent application was published on May 07, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KATO Yuki (c/o Materials Research...