INTERNATIONAL PATENT: NIPPON POLYTECH CORP., 日本ポリテック株式会社 FILES APPLICATION FOR "POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, ORGANIC EL ELEMENT BARRIER RIB, ORGANIC EL ELEMENT INSULATING FILM AND ORGANIC EL ELEMENT"

GENEVA, April 28 -- NIPPON POLYTECH CORP. (370-1 Nibukata-machi, Hachioji-shi, Tokyo1930822), 日本ポリテック株式会社 (東京都八王子市弐分方町３７０－１) filed a patent application (PCT/JP2025/036192) for "POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, ORGANIC EL ELEMENT BARRIER RIB, ORGANIC EL ELEMENT INSULATING FILM, AND ORGANIC EL ELEMENT" on Oct 14, 2025. With publication no. WO/2026/083961, the details related to the patent application was published on Apr 23, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is ma...