GENEVA, June 24 -- PLANSEE SHANGHAI HIGH PERFORMANCE MATERIAL LTD filed a patent application (CN2025/137441) for “NiMo SPUTTERING TARGET”. With publication no. WO/2026/114209, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C23C 14/34
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Disclaimer: Curated by HT Syndication....