INTERNATIONAL PATENT: NEXWAFE GMBH FILES APPLICATION FOR "PROCESS CHAMBER AND DEVICE FOR VAPOR PHASE DEPOSITION OF A SEMICONDUCTOR LAYER ON A SUBSTRATE"

GENEVA, March 30 -- NEXWAFE GMBH (Hans-Bunte-Strasse 1979108 Freiburg) filed a patent application (PCT/EP2025/075982) for "PROCESS CHAMBER AND DEVICE FOR VAPOR PHASE DEPOSITION OF A SEMICONDUCTOR LAYER ON A SUBSTRATE" on Sep 12, 2025. With publication no. WO/2026/061882, the details related to the patent application was published on Mar 26, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): VESCOVI, Giuliano Porilho (c/o NexWafe GmbHHans-Bunte-Strasse 1979108 Freiburg), MAIXNER, Hannes (c/o NexWafe GmbHHans-Bunte-Strasse 1979108 Freiburg), BECKER, Guido (c/o NexWafe GmbHHans-Bunte-Strasse 19791...