GENEVA, Aug. 14 -- TOKYO ELECTRON LIMITED filed a patent application (KR2026/002016) for “NANOSTRUCTURE-BASED HIGH-PERFORMANCE RADICAL AND CATION MEASUREMENT DEVICE AND METHOD FOR MANUFACTURING SAME”. With publication no. WO/2026/168939, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: G01N 27/04
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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