International Patent: MULTI-MODAL DEEP LEARNING NETWORK-BASED OVERLAY MARK ASYMMETRY COMPENSATION METHOD AND APPARATUS

GENEVA, July 2 -- MEIJIE OPTOELECTRONICS TECHNOLOGY (SHANGHAI) CO., LTD. filed a patent application (CN2025/147304) for “MULTI-MODAL DEEP LEARNING NETWORK-BASED OVERLAY MARK ASYMMETRY COMPENSATION METHOD AND APPARATUS”. With publication no. WO/2026/130578, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/20

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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