International Patent: MODEL FOR PREDICTING HIGH-AFFINITY MUTATION SITE OF ANTIBODY, AND CONSTRUCTION METHOD THEREFOR AND USE THEREOF

GENEVA, July 6 -- BIOINTRON BIOLOGICAL INC. filed a patent application (CN2025/143190) for “MODEL FOR PREDICTING HIGH-AFFINITY MUTATION SITE OF ANTIBODY, AND CONSTRUCTION METHOD THEREFOR AND USE THEREOF”. With publication no. WO/2026/138606, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G16B 20/30

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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