GENEVA, Aug. 14 -- APPLIED MATERIALS, INC. filed a patent application (US2025/014404) for “METROLOGY MODULE WITH NON-FLAT MIRROR FOR CHEMICAL MECHANICAL POLISHING SYSTEMS”. With publication no. WO/2026/169232, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: B24B 37/013
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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