GENEVA, July 6 -- CSL PLASMA INC. filed a patent application (IB2025/063357) for “METHODS AND SYSTEMS FOR PLASMA PROCESSING”. With publication no. WO/2026/139868, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C07K 1/14
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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