International Patent: METHOD OF INLINE METROLOGY IN A LITHOGRAPHIC PROCESS

GENEVA, June 26 -- ASML NETHERLANDS B.V. filed a patent application (EP2025/081892) for “METHOD OF INLINE METROLOGY IN A LITHOGRAPHIC PROCESS”. With publication no. WO/2026/119484, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G03F 7/20

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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