International Patent: METHOD OF FABRICATION OF HIGH SPATIAL RESOLUTION AND FAST SENSORS ON A CMOS PLATFORM

GENEVA, July 31 -- TECHNISCHE UNIVERSITEIT DELFT filed a patent application (NL2026/050026) for “METHOD OF FABRICATION OF HIGH SPATIAL RESOLUTION AND FAST SENSORS ON A CMOS PLATFORM”. With publication no. WO/2026/160972, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G01N 27/22

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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