International Patent: METHOD OF A CRITICAL DIMENSION MEASUREMENT ON A SUBSTRATE, A METHOD OF MANUFACTURING ONE OR MORE SUB-PIXEL STRUCTURES, AND APPARATUS FOR INSPECTING THE SUBSTRATE

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (CN2025/081038) for “METHOD OF A CRITICAL DIMENSION MEASUREMENT ON A SUBSTRATE, A METHOD OF MANUFACTURING ONE OR MORE SUB-PIXEL STRUCTURES, AND APPARATUS FOR INSPECTING THE SUBSTRATE”. With publication no. WO/2026/183785, here are the other details related to the patent application:

Kind: Initial Publication with ISR [A1]

IPC: G01B 15/00

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

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