GENEVA, July 27 -- HD MICROSYSTEMS, LTD. filed a patent application (JP2025/001434) for “METHOD FOR PRODUCING POLYIMIDE PRECURSOR COMPOSITION, METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED OBJECT, POLYIMIDE PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE”. With publication no. WO/2026/154650, here are the other details related to the patent application:
Kind: Initial Publication with ISR [A1]
IPC: C08G 73/12
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
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